plasma-source ion implantation
plasma-source ion implantation[¦plaz·mə ‚sȯrs ′ī·ən ‚im·plan‚tā·shən]
A method of ion implantation in which the workpiece is placed in a plasma containing the appropriate ion species and is repetitively pulse-biased to a high negative potential so that positive plasma ions are accelerated to the surface and implant in the bulk material. Abbreviated PSII.
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.