reactive ion etching


Also found in: Acronyms.

reactive ion etching

[rē′ak·tiv ′ī‚än ‚ech·iŋ]
(electronics)
A directed chemical etching process used in integrated circuit fabrication in which chemically active ions are accelerated along electric field lines to meet a substrate perpendicular to its surface.
McGraw-Hill Dictionary of Scientific & Technical Terms, 6E, Copyright © 2003 by The McGraw-Hill Companies, Inc.
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References in periodicals archive ?
Yi, "Large-area multicrystalline silicon solar cell fabrication using reactive ion etching (RIE)," Solar Energy Materials and Solar Cells, vol.
Figure 7 shows the optical microscopic photographs of the lithographic images after reactive ion etching. These patterns still remained clear and intact.
Another way to effectively increase resist thickness while using heavier ions is to move away from traditional resist exposure and take advantage of ion implantation effects that can produce a negative resist pattern if developed by reactive ion etching [61-63].
Yu, "New colloidal lithographic nanopatterns fabricated by combining pre-heating and reactive ion etching," Nanoscale Research Letters, vol.
Furthermore, W/O/W and O/W/O double emulsions were generated using pattern wettability to reflect its efficiency [7].To the best of the author's knowledge, there are minimal studies been done towards the relationships between the process parameters and the wettability effect, hence this paper studies the relationship between controllable process parameters and wetability of the etched Platinum metallization layer after Reactive Ion Etching (RIE).
For example, reactive ion etching (RIE) [7] is one of the candidates for texturing mc-Si cells and can enhance cell efficiency sufficiently.
In addition, the following devices were introduced in form of posters: Vibrating Sample Magnetometer (VSM), Freeze Drying, Plasma-Enhanced Chemical Vapor Deposition (PECVD), Animal Spectrometer, Deep Reactive Ion Etching and Deep Silicon Etching, Electrospinning, Pulse Electrical Explosion (PEE), Producer of PNC and FMI Metallic Nano Colloids, and High Pressure.
These polymer films acted as protective layers for Au substrate or silicon wafers in the subsequent chemical wet etching or reactive ion etching process.
The researchers have already manufactured a 4-millimeter-diameter radial inflow turbine wheel from silicon using deep reactive ion etching - a relatively new micro-fabrication method, according to Epstein.
Device fabrication started withmesa isolation using B[Cl.sub.3] etchants fromthe reactive ion etching system.
The five new achievements were a device to determine specific area (BET) of nanomaterials with the ability to characterize nanostructured materials, deep reactive ion etching (DRIE) device with the ability to create vertical and deep micrometric and nanometric structures, capillary electrophoresis device with the ability to quantitatively and qualitatively detect medicine, animal spectroscopy device (HiReSPECT) with the ability to take images from small animals, and Sinadoxosome nanomedicine.

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