recoil implantation

recoil implantation

[¦rē‚kȯil ‚im·plan′tā·shən]
(electronics)
A mechanism for ion-beam mixing of a film and a substrate in which atoms are driven from the film into the substrate as a result of direct collisions with incident ions.
References in periodicals archive ?
The VSEA approach integrates the three processes that are unleashed within the plasma doping process: conventional particle acceleration, chemisorption and recoil implantation.