tetrachlorosilane


Also found in: Acronyms.

tetrachlorosilane

[‚te·trə‚klȯr·ə′sī‚lān]
(inorganic chemistry)
Mentioned in ?
References in periodicals archive ?
[51], the advantage of this method is capability to produce different morphologies in chains, rods, wires, ribbons and coaxial structures and the use of dangerous precursor gases such as silane (Si[H.sub.4]) or tetrachlorosilane (Si[Cl.sub.4]) can be avoided.
The hydride canister treats such gases as arsine, phosphine, diborane, silane, and organometallics, while the etch-gas canister treats boron trichloride, hydrogen chloride, hydrogen fluoride, dichlorosilane, tetrachlorosilane, and tungsten hexafluoride.